The effect of deposition parameters on performance of VME-FPC

In order to develop a multi layer photoconductive material based on CdSe with high light sensitivity for use in vacuum microelectronics flat panel camera tube (VME-FPC), a multiple sources thermal evaporated equipment with the accurate control of evaporation rate, thickness of thin film, and substrate temperature for the CdSe material has been designed and re-installed, meanwhile a new annealed technology composed of the vacuum heat pre-treatment (VBPT) and the non vacuum heat after treatment (NHAI) has been developed. The development in these two respects, along with other technologies, bring about a new multi layer CdSe photoconductive target with remarkable performance. A more dramatic result appeared: the sensitivity of our multi layer CdSe photoconductive target has been increased by two orders of magnitude while its resolution has been kept constant. This paper will mainly focus on reporting the achievements on evaporation technology, and some experimental results related to the effect of deposition parameter on performance of VME-FPC