A Novel VOx Thermosensitive Thin Film for Microbolometer Arrays

Author

Chen, Xiqu ; Li, Jie

Author_Institution

Dept. of Math. & Phys., Wuhan Polytech. Univ., Wuhan, China

fYear

2011

fDate

16-18 May 2011

Firstpage

1

Lastpage

3

Abstract

In this paper, a novel VO_x thermosensitive thin film is fabricated for microbolometer arrays. By adjusting the fabricating process parameters, some key thermoelectrical properties of the thin film can be well controlled. The designed and fabricated VO_x thin film in our laboratory has excellent thermosensitive characteristics for infrared, and its temperature coefficient of resistance (TCR) value reaches -2.05%. Measurement of the thin film shows that the film is high absorptive for medium-wave infrared (MWIR) and Long-wave infrared (LWIR).

Keywords

bolometers; dielectric thin films; optical arrays; optical design techniques; optical fabrication; optical films; thermo-optical effects; thermoelectricity; vanadium compounds; LWIR spectra; MWIR spectra; TCR; VO_x; long-wave infrared absorption; medium-wave infrared absorption; microbolometer arrays; temperature coefficient of resistance; thermoelectrical properties; thermosensitive thin film; Films; Laboratories; Resistance; Silicon; Sputtering; Substrates; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Photonics and Optoelectronics (SOPO), 2011 Symposium on

Conference_Location

Wuhan

ISSN

2156-8464

Print_ISBN

978-1-4244-6555-2

Type

conf

DOI

10.1109/SOPO.2011.5780577

Filename

5780577