DocumentCode
3327941
Title
Gettering of gas molecules in the frit sealed glass panel by thin film metal coatings
Author
Kim, Yong C. ; Paik, Dong-ki ; Kang, Nam-seok ; Kwang-Young Kim ; Park, Myung-ho
Author_Institution
FED Group, LG Electron. Inc., Seoul, South Korea
fYear
2001
fDate
2001
Firstpage
205
Lastpage
206
Abstract
The thin film of getter materials is deposited on 3.5×4.5 cm soda glass plate. The purpose of this study is to ascertain the feasibility of thin film getters for in situ pumping of impurity gases, known as H2O, CO, and O2 etc., in the field emission display (FED) panel. Zr and Ti based metal alloys are prepared by simple magnetron sputtering method. Many elements and their alloys have been tested under tight restrictions of cathode and hermetic sealing processes, i.e. acceptable activation temperature lower than 350°C to protect from cathode damage and minimizing getter degradation during sealing process. The Ti/Zr thin film getter is activated at relatively low temperature (300°C) and is shown to act as a possible in situ pump for FED
Keywords
field emission displays; getters; metallic thin films; seals (stoppers); sputtered coatings; titanium; zirconium; 300 C; CO; H2O; O2; Ti alloy; Ti-Zr; Zr alloy; activation temperature; cathode damage; field emission display; frit sealed glass panel; getter material; hermetic sealing process; impurity gas molecules; in situ pumping; magnetron sputtering; soda glass plate; thin film metal coating; Cathodes; Flat panel displays; Gases; Gettering; Glass; Impurities; Sputtering; Temperature; Titanium alloys; Zirconium;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
Conference_Location
Davis, CA
Print_ISBN
0-7803-7197-6
Type
conf
DOI
10.1109/IVMC.2001.939725
Filename
939725
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