• DocumentCode
    3327941
  • Title

    Gettering of gas molecules in the frit sealed glass panel by thin film metal coatings

  • Author

    Kim, Yong C. ; Paik, Dong-ki ; Kang, Nam-seok ; Kwang-Young Kim ; Park, Myung-ho

  • Author_Institution
    FED Group, LG Electron. Inc., Seoul, South Korea
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    205
  • Lastpage
    206
  • Abstract
    The thin film of getter materials is deposited on 3.5×4.5 cm soda glass plate. The purpose of this study is to ascertain the feasibility of thin film getters for in situ pumping of impurity gases, known as H2O, CO, and O2 etc., in the field emission display (FED) panel. Zr and Ti based metal alloys are prepared by simple magnetron sputtering method. Many elements and their alloys have been tested under tight restrictions of cathode and hermetic sealing processes, i.e. acceptable activation temperature lower than 350°C to protect from cathode damage and minimizing getter degradation during sealing process. The Ti/Zr thin film getter is activated at relatively low temperature (300°C) and is shown to act as a possible in situ pump for FED
  • Keywords
    field emission displays; getters; metallic thin films; seals (stoppers); sputtered coatings; titanium; zirconium; 300 C; CO; H2O; O2; Ti alloy; Ti-Zr; Zr alloy; activation temperature; cathode damage; field emission display; frit sealed glass panel; getter material; hermetic sealing process; impurity gas molecules; in situ pumping; magnetron sputtering; soda glass plate; thin film metal coating; Cathodes; Flat panel displays; Gases; Gettering; Glass; Impurities; Sputtering; Temperature; Titanium alloys; Zirconium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
  • Conference_Location
    Davis, CA
  • Print_ISBN
    0-7803-7197-6
  • Type

    conf

  • DOI
    10.1109/IVMC.2001.939725
  • Filename
    939725