DocumentCode :
3328101
Title :
Electrical requirements for FED internal support structure
Author :
Dunphy, J.C. ; Schropp, D.R., Jr.
Author_Institution :
Candescent Technol. Corp., San Jose, CA, USA
fYear :
2001
fDate :
2001
Firstpage :
221
Lastpage :
222
Abstract :
One of the challenges of developing high voltage FED technology is eliminating distortion of the image near internal support structures or spacers. For the past several years Candescent has demonstrated FEDs with internal spacer structures which are invisible to the user. This achievement began with a thorough understanding of the physics underlying the problem combined with experimental techniques for quantifying it. This paper describes a model and measurements of one of the causes of spacer visibility, charging of the spacer surface by impingement of electrons Rutherford scattered from the faceplate
Keywords :
Rutherford backscattering; field emission displays; surface charging; electrical properties; electron Rutherford scattering; faceplate; high-voltage FED technology; image distortion; internal spacer; internal support structure; spacer surface charging; spacer visibility; Anodes; Cathodes; Coatings; Displays; Electron beams; Electron emission; Image analysis; Optical scattering; Surface charging; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
Conference_Location :
Davis, CA
Print_ISBN :
0-7803-7197-6
Type :
conf
DOI :
10.1109/IVMC.2001.939733
Filename :
939733
Link To Document :
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