Title :
Identification of artefacts in Auger electron spectroscopy due to surface topography
Author :
Gelsthorpe, A. ; El-Gomati, M.M.
Author_Institution :
SRL (Europe), Manchester, UK
Abstract :
Surface analysis using Auger electron spectroscopy is a highly accurate technique. However, its application to sharp topographies results in artefacts that could lead to a change of the collected Auger signal by more than 100% of the true elemental concentration. Such a geometry is representative of micro-fabricated field emission structures. A new multi-channel detector spanning 360° of azimuth angle in six segments has been developed for the rapid identification of edge artefacts when analysed using a cylindrical mirror analyser. The Auger electron signal from a tungsten coated volcano-shaped silicon field emitter structure shows Auger electron signal enhancement of ×2 on opposing sides
Keywords :
Auger electron spectroscopy; electron field emission; elemental semiconductors; silicon; surface topography; tungsten; Auger electron spectroscopy; Si-W; cylindrical mirror analyser; edge artefacts; elemental concentration; multi-channel detector; surface analysis; surface topography; tungsten coated volcano shaped silicon field emitter; Azimuth; Detectors; Electron emission; Geometry; Lead; Mirrors; Silicon; Spectroscopy; Surface topography; Tungsten;
Conference_Titel :
Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
Conference_Location :
Davis, CA
Print_ISBN :
0-7803-7197-6
DOI :
10.1109/IVMC.2001.939743