DocumentCode
3328229
Title
Identification of artefacts in Auger electron spectroscopy due to surface topography
Author
Gelsthorpe, A. ; El-Gomati, M.M.
Author_Institution
SRL (Europe), Manchester, UK
fYear
2001
fDate
2001
Firstpage
241
Lastpage
242
Abstract
Surface analysis using Auger electron spectroscopy is a highly accurate technique. However, its application to sharp topographies results in artefacts that could lead to a change of the collected Auger signal by more than 100% of the true elemental concentration. Such a geometry is representative of micro-fabricated field emission structures. A new multi-channel detector spanning 360° of azimuth angle in six segments has been developed for the rapid identification of edge artefacts when analysed using a cylindrical mirror analyser. The Auger electron signal from a tungsten coated volcano-shaped silicon field emitter structure shows Auger electron signal enhancement of ×2 on opposing sides
Keywords
Auger electron spectroscopy; electron field emission; elemental semiconductors; silicon; surface topography; tungsten; Auger electron spectroscopy; Si-W; cylindrical mirror analyser; edge artefacts; elemental concentration; multi-channel detector; surface analysis; surface topography; tungsten coated volcano shaped silicon field emitter; Azimuth; Detectors; Electron emission; Geometry; Lead; Mirrors; Silicon; Spectroscopy; Surface topography; Tungsten;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
Conference_Location
Davis, CA
Print_ISBN
0-7803-7197-6
Type
conf
DOI
10.1109/IVMC.2001.939743
Filename
939743
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