• DocumentCode
    3328229
  • Title

    Identification of artefacts in Auger electron spectroscopy due to surface topography

  • Author

    Gelsthorpe, A. ; El-Gomati, M.M.

  • Author_Institution
    SRL (Europe), Manchester, UK
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    241
  • Lastpage
    242
  • Abstract
    Surface analysis using Auger electron spectroscopy is a highly accurate technique. However, its application to sharp topographies results in artefacts that could lead to a change of the collected Auger signal by more than 100% of the true elemental concentration. Such a geometry is representative of micro-fabricated field emission structures. A new multi-channel detector spanning 360° of azimuth angle in six segments has been developed for the rapid identification of edge artefacts when analysed using a cylindrical mirror analyser. The Auger electron signal from a tungsten coated volcano-shaped silicon field emitter structure shows Auger electron signal enhancement of ×2 on opposing sides
  • Keywords
    Auger electron spectroscopy; electron field emission; elemental semiconductors; silicon; surface topography; tungsten; Auger electron spectroscopy; Si-W; cylindrical mirror analyser; edge artefacts; elemental concentration; multi-channel detector; surface analysis; surface topography; tungsten coated volcano shaped silicon field emitter; Azimuth; Detectors; Electron emission; Geometry; Lead; Mirrors; Silicon; Spectroscopy; Surface topography; Tungsten;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
  • Conference_Location
    Davis, CA
  • Print_ISBN
    0-7803-7197-6
  • Type

    conf

  • DOI
    10.1109/IVMC.2001.939743
  • Filename
    939743