DocumentCode
3328306
Title
Growth and evaluation of nanostructured carbon films for triode field emitter application
Author
Park, Kyung Ho ; Han, Hyung Jun ; Choi, Seungho ; Lee, Kyung Moon ; Lee, Soonil ; Koh, Ken Ha
Author_Institution
Dept. of Molecular Sci. & Technol., Ajou Univ., Suwon, South Korea
fYear
2001
fDate
2001
Firstpage
249
Lastpage
250
Abstract
Through the systematic investigation of the emission properties and the structure of the nanostructured carbon films, we identified the deposition condition for the most favorable film morphology for the triode-structure fabrication, which does not compromise the emission characteristics. Moreover, we realized the triode structure via the photolithography technique by taking advantage of the selectivity of nanostructured-carbon-film growth using metal catalyst
Keywords
CVD coatings; carbon; catalysis; electron field emission; nanostructured materials; photolithography; triodes; vacuum microelectronics; C; HFCVD growth; metal catalyst; nanostructured carbon film; photolithography; triode field emitter; Anodes; Carbon dioxide; Carbon nanotubes; Circuits; Fabrication; Lithography; Moon; Morphology; Nanostructures; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
Conference_Location
Davis, CA
Print_ISBN
0-7803-7197-6
Type
conf
DOI
10.1109/IVMC.2001.939747
Filename
939747
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