DocumentCode :
3328437
Title :
Variations in structure and emission characteristics of nanostructured carbon films prepared by HFCVD method due to the addition of ammonia in source gases
Author :
Choi, Seungho ; Park, Kyung Ho ; Han, Hyung Jun ; Lee, Kyung Moon ; Lee, Soonil ; Koh, Ken Ha
Author_Institution :
Dept. of Molecular Sci. & Technol., Ajou Univ., Suwon, South Korea
fYear :
2001
fDate :
2001
Firstpage :
265
Lastpage :
266
Abstract :
We investigated the structural variation and the concomitant change in the emission characteristics of HFCVD-grown nanostructured carbon films induced by the addition of ammonia to source gases; nanostructured films were the mixture of nanotubes and nanoclusters. As the concentration of ammonia was increased, large structural variation, including the increase of disorder in the atomic bonding and the decrease in size of graphitic sheets making up nanotubes and nanoparticles, was observed. Moreover, changes in the emission properties corresponding to the structural degradation was observed
Keywords :
CVD coatings; carbon; carbon nanotubes; electron field emission; nanostructured materials; C; HFCVD growth; NH3; ammonia; atomic bonding; disorder; field emission; graphitic sheets; nanoclusters; nanostructured carbon film; nanotubes; structure; Carbon dioxide; Carbon nanotubes; Degradation; Gases; Nanoparticles; Scanning electron microscopy; Semiconductor films; Silicon; Spectroscopy; Transmission electron microscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
Conference_Location :
Davis, CA
Print_ISBN :
0-7803-7197-6
Type :
conf
DOI :
10.1109/IVMC.2001.939755
Filename :
939755
Link To Document :
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