• DocumentCode
    3328474
  • Title

    High-temperature electron emission from diamond films for energy conversion applications

  • Author

    Shin, S.H. ; Fisher, T.S. ; Walker, D.G. ; Strauss, A.M. ; Kang, W.P. ; Davidson, J.L.

  • Author_Institution
    ME Dept., Vanderbilt Univ., Nashville, TN, USA
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    269
  • Lastpage
    270
  • Abstract
    This work examines the electron field emission characteristics of polycrystalline diamond films at elevated temperatures. In recent years, considerable interest has developed in energy conversion applications of polycrystalline diamond films. However, little work has been considered for the field emission characteristics of diamond at elevated temperatures. The motivation behind this study involves direct energy conversion applications in power generation systems, where high temperatures exist. N-doped polycrystalline diamond films were grown by plasma-enhanced chemical-vapor deposition (PECVD). To investigate the effect of increased temperatures on field emission, current-voltage measurements were taken from the same diamond film at varying temperatures. Results from these measurements indicate a decrease in the turn-on voltage with increasing temperature. Further analysis of the temperature dependency of diamond was achieved through the parameter estimation of the effective emitting area, field enhancement factor, and work function. These results suggest that high-energy electrons are responsible for improved emission at high temperature
  • Keywords
    diamond; direct energy conversion; electron field emission; high-temperature effects; plasma CVD coatings; work function; C:N; N-doped polycrystalline diamond film; current-voltage characteristics; direct energy conversion; effective emitting area; electron field emission; field enhancement factor; high-temperature electron emission; plasma-enhanced chemical vapor deposition; power generation; temperature dependence; turn-on voltage; work function; Chemicals; Current measurement; Electron emission; Energy conversion; Plasma applications; Plasma chemistry; Plasma measurements; Plasma properties; Plasma temperature; Power generation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
  • Conference_Location
    Davis, CA
  • Print_ISBN
    0-7803-7197-6
  • Type

    conf

  • DOI
    10.1109/IVMC.2001.939757
  • Filename
    939757