DocumentCode :
3328474
Title :
High-temperature electron emission from diamond films for energy conversion applications
Author :
Shin, S.H. ; Fisher, T.S. ; Walker, D.G. ; Strauss, A.M. ; Kang, W.P. ; Davidson, J.L.
Author_Institution :
ME Dept., Vanderbilt Univ., Nashville, TN, USA
fYear :
2001
fDate :
2001
Firstpage :
269
Lastpage :
270
Abstract :
This work examines the electron field emission characteristics of polycrystalline diamond films at elevated temperatures. In recent years, considerable interest has developed in energy conversion applications of polycrystalline diamond films. However, little work has been considered for the field emission characteristics of diamond at elevated temperatures. The motivation behind this study involves direct energy conversion applications in power generation systems, where high temperatures exist. N-doped polycrystalline diamond films were grown by plasma-enhanced chemical-vapor deposition (PECVD). To investigate the effect of increased temperatures on field emission, current-voltage measurements were taken from the same diamond film at varying temperatures. Results from these measurements indicate a decrease in the turn-on voltage with increasing temperature. Further analysis of the temperature dependency of diamond was achieved through the parameter estimation of the effective emitting area, field enhancement factor, and work function. These results suggest that high-energy electrons are responsible for improved emission at high temperature
Keywords :
diamond; direct energy conversion; electron field emission; high-temperature effects; plasma CVD coatings; work function; C:N; N-doped polycrystalline diamond film; current-voltage characteristics; direct energy conversion; effective emitting area; electron field emission; field enhancement factor; high-temperature electron emission; plasma-enhanced chemical vapor deposition; power generation; temperature dependence; turn-on voltage; work function; Chemicals; Current measurement; Electron emission; Energy conversion; Plasma applications; Plasma chemistry; Plasma measurements; Plasma properties; Plasma temperature; Power generation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
Conference_Location :
Davis, CA
Print_ISBN :
0-7803-7197-6
Type :
conf
DOI :
10.1109/IVMC.2001.939757
Filename :
939757
Link To Document :
بازگشت