DocumentCode :
3328647
Title :
Effects of metal buffer layers on the hot filament chemical vapor deposition of nanostructured carbon films
Author :
Lee, Kyung Moon ; Han, Hyung Jun ; Choi, Seungho ; Park, Kyung Ho ; Oh, Soo-ghee ; Lee, Soonil ; Koh, Ken Ha
Author_Institution :
Dept. of Molecular Sci. & Technol., Ajou Univ., Suwon, South Korea
fYear :
2001
fDate :
2001
Firstpage :
289
Lastpage :
290
Abstract :
Examined how the addition of different metal buffer layers underneath the catalytic-metal layer affected the growth of nanostructured carbon films which were the composite films of carbon nanotubes and carbon nanoclusters. Even when the sputter-deposition of catalytic-metal layers and the HFCVD of carbon films were carried out under identical conditions, different buffer layers resulted in significant difference in the microscopic structure of carbon films. SEM and AFM investigation revealed that the difference in the morphology of metal catalyst was not the sole cause for the observed diverse growth of nanostructured carbon films
Keywords :
adhesion; atomic force microscopy; carbon nanotubes; chemical vapour deposition; cold-cathode tubes; electron field emission; scanning electron microscopy; AFM; C; SEM; adhesion; carbon nanoclusters; carbon nanotubes; cold cathodes; hot filament chemical vapor deposition; metal buffer layers; microscopic structure; nanostructured films; Adhesives; Buffer layers; Carbon dioxide; Carbon nanotubes; Chemical vapor deposition; Chromium; Moon; Rough surfaces; Surface morphology; Surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
Conference_Location :
Davis, CA
Print_ISBN :
0-7803-7197-6
Type :
conf
DOI :
10.1109/IVMC.2001.939767
Filename :
939767
Link To Document :
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