• DocumentCode
    3328647
  • Title

    Effects of metal buffer layers on the hot filament chemical vapor deposition of nanostructured carbon films

  • Author

    Lee, Kyung Moon ; Han, Hyung Jun ; Choi, Seungho ; Park, Kyung Ho ; Oh, Soo-ghee ; Lee, Soonil ; Koh, Ken Ha

  • Author_Institution
    Dept. of Molecular Sci. & Technol., Ajou Univ., Suwon, South Korea
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    289
  • Lastpage
    290
  • Abstract
    Examined how the addition of different metal buffer layers underneath the catalytic-metal layer affected the growth of nanostructured carbon films which were the composite films of carbon nanotubes and carbon nanoclusters. Even when the sputter-deposition of catalytic-metal layers and the HFCVD of carbon films were carried out under identical conditions, different buffer layers resulted in significant difference in the microscopic structure of carbon films. SEM and AFM investigation revealed that the difference in the morphology of metal catalyst was not the sole cause for the observed diverse growth of nanostructured carbon films
  • Keywords
    adhesion; atomic force microscopy; carbon nanotubes; chemical vapour deposition; cold-cathode tubes; electron field emission; scanning electron microscopy; AFM; C; SEM; adhesion; carbon nanoclusters; carbon nanotubes; cold cathodes; hot filament chemical vapor deposition; metal buffer layers; microscopic structure; nanostructured films; Adhesives; Buffer layers; Carbon dioxide; Carbon nanotubes; Chemical vapor deposition; Chromium; Moon; Rough surfaces; Surface morphology; Surface roughness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
  • Conference_Location
    Davis, CA
  • Print_ISBN
    0-7803-7197-6
  • Type

    conf

  • DOI
    10.1109/IVMC.2001.939767
  • Filename
    939767