• DocumentCode
    3328794
  • Title

    The emission properties of the nanodiamond films produced in CH4/CO2 microwave plasma

  • Author

    Blyablin, A. ; Dvorkin, V.V. ; Dzbanovsky, N.N. ; Suetin, N.V. ; Pal, A.F.

  • Author_Institution
    Nucl. Phys. Inst., Moscow State Univ., Russia
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    303
  • Lastpage
    304
  • Abstract
    The introduction the carbon dioxide into CH4 plasma for the synthesis of diamond films on Si has been studied by many authors, mainly for deposition high quality diamond films at a relative low temperature. The aim of this report is to show, that under the certain conditions it is possible to obtain a good electron emitting films in CO 2 + CH4 gas mix by MW CVD process
  • Keywords
    diamond; electron field emission; nanostructured materials; plasma CVD coatings; C; CO2; electron field emission; methane/carbon dioxide gas mixture; microwave plasma CVD; nanodiamond film; Annealing; Carbon dioxide; Electron emission; Hydrogen; Plasma accelerators; Plasma properties; Plasma temperature; Semiconductor films; Silicon carbide; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
  • Conference_Location
    Davis, CA
  • Print_ISBN
    0-7803-7197-6
  • Type

    conf

  • DOI
    10.1109/IVMC.2001.939774
  • Filename
    939774
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3328794