DocumentCode :
3328794
Title :
The emission properties of the nanodiamond films produced in CH4/CO2 microwave plasma
Author :
Blyablin, A. ; Dvorkin, V.V. ; Dzbanovsky, N.N. ; Suetin, N.V. ; Pal, A.F.
Author_Institution :
Nucl. Phys. Inst., Moscow State Univ., Russia
fYear :
2001
fDate :
2001
Firstpage :
303
Lastpage :
304
Abstract :
The introduction the carbon dioxide into CH4 plasma for the synthesis of diamond films on Si has been studied by many authors, mainly for deposition high quality diamond films at a relative low temperature. The aim of this report is to show, that under the certain conditions it is possible to obtain a good electron emitting films in CO 2 + CH4 gas mix by MW CVD process
Keywords :
diamond; electron field emission; nanostructured materials; plasma CVD coatings; C; CO2; electron field emission; methane/carbon dioxide gas mixture; microwave plasma CVD; nanodiamond film; Annealing; Carbon dioxide; Electron emission; Hydrogen; Plasma accelerators; Plasma properties; Plasma temperature; Semiconductor films; Silicon carbide; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
Conference_Location :
Davis, CA
Print_ISBN :
0-7803-7197-6
Type :
conf
DOI :
10.1109/IVMC.2001.939774
Filename :
939774
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3328794
بازگشت