DocumentCode
3329191
Title
Full-Field Thickness Measuring of Photoresist on Spherical Surface in Lithography Techniques
Author
Jingyu Liang ; Yiyong Liang
Author_Institution
State Key Lab. of Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
fYear
2011
fDate
16-18 May 2011
Firstpage
1
Lastpage
3
Abstract
In this paper, we introduce a method for measuring the thickness of photoresist on the surface of full-field spherical substate. This method is implemented by measuring the reflection power of incident light. Compared with other metrology, our method has many features such as real-time and compact optical setup.
Keywords
lithography; optical variables measurement; photoresists; reflectivity; thickness measurement; compact optical setup; full-field spherical substate; full-field thickness measurement; lithography; photoresist; real-time setup; reflection measuring; Coatings; Lithography; Optical reflection; Resists; Substrates; Thickness measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Photonics and Optoelectronics (SOPO), 2011 Symposium on
Conference_Location
Wuhan
ISSN
2156-8464
Print_ISBN
978-1-4244-6555-2
Type
conf
DOI
10.1109/SOPO.2011.5780647
Filename
5780647
Link To Document