Micromachined arrayed dip pen nanolithography probes for sub-100 nm direct chemistry patterning

Author

Bullen, David ; Wang, Xuefeug ; Zou, Jun ; Hong, Seunghun ; Chung, Sung-Wook ; Ryu, Kee ; Fan, Zhifang ; Mirkin, Chad ; Liu, Chang

Author_Institution

Micro Actuators, Sensors, & Syst. Group, Illinois Univ., Urbana, IL, USA

fYear

2003

fDate

19-23 Jan. 2003

Firstpage

4

Lastpage

7

Abstract

We report the development of micromachined passive and active probe arrays for parallel dip pen nanolithography (DPN). DPN is a soft lithography method that allows direct, mask-less deposition of chemicals onto substrates with sub 100-nm resolution. An active DPN probe with thermal bimetallic actuation has been developed and tested. Lithographic results and an analytical tool for optimizing active probe designs with respect to a number of performance criteria are also demonstrated.

Keywords

micromachining; nanolithography; pattern formation; 100 nm; direct maskless deposition; micromachined arrayed dip pen nanolithography probes; performance criteria; soft lithography method; sub 100-nm resolution; sub-100 nm direct chemistry patterning; thermal bimetallic actuation; Atomic force microscopy; Chemicals; Chemistry; Electronics packaging; Nanobioscience; Nanolithography; Probes; Sensor arrays; Silicon; Soft lithography;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on

ISSN

1084-6999

Print_ISBN

0-7803-7744-3

Type

conf

DOI

10.1109/MEMSYS.2003.1189673

Filename

1189673