DocumentCode :
3331271
Title :
Micromachined arrayed dip pen nanolithography probes for sub-100 nm direct chemistry patterning
Author :
Bullen, David ; Wang, Xuefeug ; Zou, Jun ; Hong, Seunghun ; Chung, Sung-Wook ; Ryu, Kee ; Fan, Zhifang ; Mirkin, Chad ; Liu, Chang
Author_Institution :
Micro Actuators, Sensors, & Syst. Group, Illinois Univ., Urbana, IL, USA
fYear :
2003
fDate :
19-23 Jan. 2003
Firstpage :
4
Lastpage :
7
Abstract :
We report the development of micromachined passive and active probe arrays for parallel dip pen nanolithography (DPN). DPN is a soft lithography method that allows direct, mask-less deposition of chemicals onto substrates with sub 100-nm resolution. An active DPN probe with thermal bimetallic actuation has been developed and tested. Lithographic results and an analytical tool for optimizing active probe designs with respect to a number of performance criteria are also demonstrated.
Keywords :
micromachining; nanolithography; pattern formation; 100 nm; direct maskless deposition; micromachined arrayed dip pen nanolithography probes; performance criteria; soft lithography method; sub 100-nm resolution; sub-100 nm direct chemistry patterning; thermal bimetallic actuation; Atomic force microscopy; Chemicals; Chemistry; Electronics packaging; Nanobioscience; Nanolithography; Probes; Sensor arrays; Silicon; Soft lithography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on
ISSN :
1084-6999
Print_ISBN :
0-7803-7744-3
Type :
conf
DOI :
10.1109/MEMSYS.2003.1189673
Filename :
1189673
Link To Document :
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