DocumentCode
3331460
Title
Gated field emitter using carbon nanotubes for vacuum microelectronic devices
Author
Jang, Yoon-Taek ; Choi, Chang-Hoon ; Ju, Byeong-Kwon ; Ahn, Jin-Ho ; Lee, Yun-Hi
Author_Institution
Microsystem Res. Ctr, Korea Inst. of Sci. & Technol., Seoul, South Korea
fYear
2003
fDate
19-23 Jan. 2003
Firstpage
37
Lastpage
40
Abstract
We have fabricated a gated field emitter using directly grown carbon nanotubes (CNTs) as an electron emission source. Vertically aligned CNTs were grown at the center of the gate hole using thermal chemical vapor deposition. In order to reduce the leakage current due to flowing current along CNTs grown on the sidewalls of the gate hole, we adopted a new process scheme such as sidewall protector. The leakage current of gated CNT emitter with sidewall protector shows a decrease of 85.8 % compared to that of a conventional structure.
Keywords
carbon nanotubes; chemical vapour deposition; electron field emission; leakage currents; vacuum microelectronics; C; carbon nanotubes; gated field emitter; leakage current; sidewall protector; thermal chemical vapor deposition; vertically aligned nanotubes; Carbon nanotubes; Chemical vapor deposition; Electron emission; Fabrication; Inductors; Leakage current; Microelectronics; Printing; Protection; Sputter etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on
ISSN
1084-6999
Print_ISBN
0-7803-7744-3
Type
conf
DOI
10.1109/MEMSYS.2003.1189681
Filename
1189681
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