• DocumentCode
    3331460
  • Title

    Gated field emitter using carbon nanotubes for vacuum microelectronic devices

  • Author

    Jang, Yoon-Taek ; Choi, Chang-Hoon ; Ju, Byeong-Kwon ; Ahn, Jin-Ho ; Lee, Yun-Hi

  • Author_Institution
    Microsystem Res. Ctr, Korea Inst. of Sci. & Technol., Seoul, South Korea
  • fYear
    2003
  • fDate
    19-23 Jan. 2003
  • Firstpage
    37
  • Lastpage
    40
  • Abstract
    We have fabricated a gated field emitter using directly grown carbon nanotubes (CNTs) as an electron emission source. Vertically aligned CNTs were grown at the center of the gate hole using thermal chemical vapor deposition. In order to reduce the leakage current due to flowing current along CNTs grown on the sidewalls of the gate hole, we adopted a new process scheme such as sidewall protector. The leakage current of gated CNT emitter with sidewall protector shows a decrease of 85.8 % compared to that of a conventional structure.
  • Keywords
    carbon nanotubes; chemical vapour deposition; electron field emission; leakage currents; vacuum microelectronics; C; carbon nanotubes; gated field emitter; leakage current; sidewall protector; thermal chemical vapor deposition; vertically aligned nanotubes; Carbon nanotubes; Chemical vapor deposition; Electron emission; Fabrication; Inductors; Leakage current; Microelectronics; Printing; Protection; Sputter etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-7744-3
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2003.1189681
  • Filename
    1189681