Fabrication of 3D microstructures with inclined/rotated UV lithography

Author

Han, Manhee ; Woonseob Lee ; Sung-Keun Lee ; Lee, Seung S.

Author_Institution

Dept. of Mech. Eng., Pohang Univ. of Sci. & Technol., South Korea

fYear

2003

fDate

19-23 Jan. 2003

Firstpage

554

Lastpage

557

Abstract

This paper presents a novel microfabrication technology of three-dimensional (3D) microstructures with inclined/rotated UV lithography. Various 3D microstructures have been made of negative thick photoresist, SU-8, using single inclined, double inclined, or inclined & rotated UV lithography. In some cases, we also exploit the UV reflected by the substrate as well as the incident UV from the source to form various microstructures. With the 3D microfabrication technology, various 3D microstructures are simply and easily fabricated such as oblique cylinders, embedded channels, bridges, V-grooves, truncated cones, and so on.

Keywords

micromachining; nanolithography; ultraviolet lithography; 3D microstructures fabrication; SU-8; V-grooves; bridges; double inclined lithography; embedded channels; inclined/rotated UV lithography; negative thick photoresist; oblique cylinders; single inclined lithography; truncated cones; Bridges; Engine cylinders; Fabrication; Mechanical engineering; Micromachining; Microstructure; Optical devices; Resists; Silicon compounds; X-ray lithography;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on

ISSN

1084-6999

Print_ISBN

0-7803-7744-3

Type

conf

DOI

10.1109/MEMSYS.2003.1189809

Filename

1189809