DocumentCode :
3333834
Title :
Electron emission characteristics of pulsed laser deposited diamond-like films
Author :
Chuang, F.Y. ; Sun, C.Y. ; Cheng, H.F. ; Huang, C.M. ; Lin, I.N.
Author_Institution :
Dept. of Electron. Eng., Nat. Taiwan Inst. of Technol., Taipei, Taiwan
fYear :
1996
fDate :
25-30 Sep 1996
Firstpage :
299
Lastpage :
304
Abstract :
Diamond like carbon (DLC) films possessing large electron emission capacity was obtained by pulsed laser deposition process. AFM morphologies and Raman spectra inferred that the proportion of SP3 -bonds is the predominating factor modifying the field emission characteristics. Large laser fluence and moderately high substrate temperature are thus required. The critical laser fluence needed to deposit DLC films with large emission current density was 10 J/cm2 for 248 nm (KrF) laser beams and 4 J/cm2 for 193 nm (ArF) laser beams, respectively. The highest emission current density was 80 μA/cm2 for DLC films deposited at 400°C using 248 nm laser beams and was 160 μA/cm2 for those grown at 200°C using 193 nm laser beams. The turn on electric field was, respectively, 11.6 MV/m and 11.4 MV/m
Keywords :
Raman spectra; atomic force microscopy; carbon; electron field emission; pulsed laser deposition; AFM morphology; C; Raman spectra; diamond like carbon film; electron emission; field emission; pulsed laser deposition; Carbon dioxide; Current density; Diamond-like carbon; Electron emission; Laser beams; Laser modes; Morphology; Optical pulses; Pulsed laser deposition; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrets, 1996. (ISE 9), 9th International Symposium on
Conference_Location :
Shanghai
Print_ISBN :
0-7803-2695-4
Type :
conf
DOI :
10.1109/ISE.1996.578087
Filename :
578087
Link To Document :
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