• DocumentCode
    3334307
  • Title

    Microneedle arrays fabricated using suspended etch mask technology combined with fluidic through wafer vias

  • Author

    Trautmann, A. ; Ruther, Patrick ; Paul, Oliver

  • Author_Institution
    Inst. for Microsystem Technol., Freiburg Univ., Germany
  • fYear
    2003
  • fDate
    19-23 Jan. 2003
  • Firstpage
    682
  • Lastpage
    685
  • Abstract
    We report the fabrication and characterization of microneedle arrays combined with (i) reservoirs for therapeutic or analytic fluids, (ii) sharp edges suitable as cutting and flaring features to increase skin permeability, and (iii) fluidic through wafer connections. Microneedle fabrication relies on a new approach combining deep reactive ion etching of silicon with suspended etch masks. This fabrication technology applies an etch mask which remains suspended above an etch cavity containing microneedle arrays and reservoirs. The structures are intended to enable painless transdermal drug delivery, e.g., application of allergen solutions in allergy diagnostics (Prick test) or of vaccines.
  • Keywords
    biomedical equipment; drug delivery systems; microfluidics; micromechanical devices; sputter etching; Prick test; allergen solutions; allergy diagnostics; characterization; cutting; deep reactive ion etching; fabrication; flaring; fluidic through wafer vias; increase skin permeability; microneedle arrays; sharp edges; suspended etch mask technology; suspended etch masks; vaccines; wafer connections; Drug delivery; Etching; Fabrication; Permeability; Pharmaceutical technology; Reservoirs; Silicon; Skin; Testing; Vaccines;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-7744-3
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2003.1189841
  • Filename
    1189841