DocumentCode :
3335359
Title :
Self organization trends in cathode boundary layer discharge (CBLD) devices for various cathode materials
Author :
Johnson, V.S. ; WeiDong Zhu ; Lopez, J.L.
Author_Institution :
Center for Microplasma Sci. & Technol., St. Peter´s Coll., Jersey City, NJ, USA
fYear :
2010
fDate :
20-24 June 2010
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. Self organization in cathode boundary layer discharge (CBLD) devices in xenon is described for several different cathode materials (Cu, Ag, Ti, W, Mo, et al). A theory for the origin of self organization is developed based on materials properties (especially electrical conductivity and magnetic susceptibility). Most of the results and discussion are based on results at a pressure of 100 Torr. Some excimer emission characteristics are also discussed and related to the self organization. Characterization of the devices is based on tabulated values for materials properties, VUV emission at 172 nm (Xe excimer), optical microscopy images, and SEM energy dispersive x-ray spectroscopy (EDS) of cathode surfaces before and after operation, respectively.
Keywords :
discharges (electric); plasma boundary layers; plasma devices; plasma diagnostics; plasma transport processes; xenon; SEM energy dispersive X-ray spectroscopy; VUV emission; Xe; cathode boundary layer discharge device; cathode materials; electrical conductivity; excimer emission characteristics; magnetic susceptibility; optical microscopy images; pressure 100 torr; wavelength 172 nm; Cathodes; Conducting materials; Conductivity; Magnetic materials; Magnetic susceptibility; Material properties; Optical microscopy; Scanning electron microscopy; Stimulated emission; Xenon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2010 Abstracts IEEE International Conference on
Conference_Location :
Norfolk, VA
ISSN :
0730-9244
Print_ISBN :
978-1-4244-5474-7
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2010.5534371
Filename :
5534371
Link To Document :
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