DocumentCode
3335559
Title
kHz range pulsed fields in partial vacuum
Author
Fang Li ; Kirkici, H.
Author_Institution
Electr. & Comput. Eng., Auburn Univ. Auburn, Auburn, AL, USA
fYear
2010
fDate
20-24 June 2010
Firstpage
1
Lastpage
1
Abstract
Insulating materials play a significant role in the performance of high voltage power systems, because, the high performance electrical insulation materials and structures must be free from unwanted and unpredictable dielectric breakdown through the insulator as well as over the surface, and along the interface between the insulator/electrode/ambient.
Keywords
electric breakdown; flashover; insulating materials; nitrogen; plasma materials processing; plasma pressure; KHz range pulsed field; N2; dielectric breakdown; electrical insulation materials; electron field emission; high voltage power system; nanodielectric material preparation; partial pressure nitrogen; surface flashover; Breakdown voltage; Computer interfaces; Dielectric materials; Dielectrics and electrical insulation; Electrodes; Flashover; Pulse power systems; Surface contamination; Vacuum breakdown; Vacuum systems;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2010 Abstracts IEEE International Conference on
Conference_Location
Norfolk, VA
ISSN
0730-9244
Print_ISBN
978-1-4244-5474-7
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2010.5534394
Filename
5534394
Link To Document