DocumentCode :
3335559
Title :
kHz range pulsed fields in partial vacuum
Author :
Fang Li ; Kirkici, H.
Author_Institution :
Electr. & Comput. Eng., Auburn Univ. Auburn, Auburn, AL, USA
fYear :
2010
fDate :
20-24 June 2010
Firstpage :
1
Lastpage :
1
Abstract :
Insulating materials play a significant role in the performance of high voltage power systems, because, the high performance electrical insulation materials and structures must be free from unwanted and unpredictable dielectric breakdown through the insulator as well as over the surface, and along the interface between the insulator/electrode/ambient.
Keywords :
electric breakdown; flashover; insulating materials; nitrogen; plasma materials processing; plasma pressure; KHz range pulsed field; N2; dielectric breakdown; electrical insulation materials; electron field emission; high voltage power system; nanodielectric material preparation; partial pressure nitrogen; surface flashover; Breakdown voltage; Computer interfaces; Dielectric materials; Dielectrics and electrical insulation; Electrodes; Flashover; Pulse power systems; Surface contamination; Vacuum breakdown; Vacuum systems;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2010 Abstracts IEEE International Conference on
Conference_Location :
Norfolk, VA
ISSN :
0730-9244
Print_ISBN :
978-1-4244-5474-7
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2010.5534394
Filename :
5534394
Link To Document :
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