• DocumentCode
    3335643
  • Title

    Future prospects for Si CMOS technology

  • Author

    Frank, D.J. ; Yuan Taur ; Hen-Sum Philip Wong

  • Author_Institution
    IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
  • fYear
    1999
  • fDate
    23-23 June 1999
  • Firstpage
    18
  • Lastpage
    21
  • Abstract
    Si CMOS technology has steadily grown in importance for the past 30 years until it is now the dominant logic technology in the electronics industry. This talk will briefly describe the current state of Si CMOS and will then concentrate on where it appears to be headed in the next decade or so.
  • Keywords
    CMOS integrated circuits; elemental semiconductors; integrated circuit technology; silicon; technological forecasting; Si; Si CMOS technology; future developments; CMOS technology; Doping profiles; FETs; Implants; Insulation; Microprocessors; Random access memory; Surface resistance; Threshold voltage; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference Digest, 1999 57th Annual
  • Conference_Location
    Santa Barbara, CA, USA
  • Print_ISBN
    0-7803-5170-3
  • Type

    conf

  • DOI
    10.1109/DRC.1999.806308
  • Filename
    806308