• DocumentCode
    3335692
  • Title

    Straddle gate transistors: high I/sub on//I/sub off/ transistors at short gate lengths

  • Author

    Tiwari, S. ; Welser, J.J. ; Kumar, A. ; Cohen, S.

  • Author_Institution
    IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
  • fYear
    1999
  • fDate
    23-23 June 1999
  • Firstpage
    26
  • Lastpage
    27
  • Abstract
    Straddle gate transistors are structures where the source/drain doped extension regions of a transistor are separated from the transistor control region through a low threshold-voltage side-wall which turns on before the transistor, and provides high conductance injection. By providing for gate modulation of this region, the transistor has effectively a longer channel length when it is off and shorter channel length when it is on. We show, experimentally and theoretically, how this leads to lower off currents, higher I/sub on//I/sub off/ ratios and a path to smaller devices that are not limited by the constraints of shallow doping extensions.
  • Keywords
    MOSFET; MOSFET; channel length; conductance injection; gate length; gate modulation; on-current/off-current ratio; shallow doping extension; sidewall; straddle gate transistor; Etching; Kinetic energy; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference Digest, 1999 57th Annual
  • Conference_Location
    Santa Barbara, CA, USA
  • Print_ISBN
    0-7803-5170-3
  • Type

    conf

  • DOI
    10.1109/DRC.1999.806311
  • Filename
    806311