DocumentCode :
3337464
Title :
Direct formation of β-FeSi2 on substrate in evacuated sealed ampoule
Author :
Oikawa, Y. ; Kim, C. ; Ozaki, H.
Author_Institution :
Dept. of Electr., Electron. & Comput. Eng., Waseda Univ., Tokyo, Japan
fYear :
2002
fDate :
25-29 Aug. 2002
Firstpage :
110
Lastpage :
113
Abstract :
A simple preparation method of β-FeSi2 on substrate was proposed by the isothermal heat treatment in an evacuated and sealed ampoule. The mechanism of this reaction process was investigated using compacted Si powder or mixed powder of Fe and Si and sputtered Fe films on Si substrates or sapphire substrates. The compacted powder was encapsulated in an ampoule and separated from substrate with sputtered Fe film. It was found that vaporized Si from Si powder reacted with Fe film to form ε-FeSi, which, in turn, initiated the reaction with Si substrate to form β-FeSi2 film. Furthermore, it was found that vaporized Fe, derived from mixed powder of Fe and Si, promoted the formation of β-FeSi2 single phase on thermally oxidized Si substrate.
Keywords :
densification; heat treatment; iron compounds; materials preparation; powder technology; semiconductor growth; semiconductor materials; thermoelectricity; β-FeSi2; Al2O3; FeSi2; Si; isothermal heat treatment; mixed powders; preparation method; sputtered Fe films; Acceleration; Crystallization; Electronic switching systems; Iron; Powders; Semiconductor films; Silicidation; Solids; Substrates; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Thermoelectrics, 2002. Proceedings ICT '02. Twenty-First International Conference on
Print_ISBN :
0-7803-7683-8
Type :
conf
DOI :
10.1109/ICT.2002.1190277
Filename :
1190277
Link To Document :
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