DocumentCode
3337464
Title
Direct formation of β-FeSi2 on substrate in evacuated sealed ampoule
Author
Oikawa, Y. ; Kim, C. ; Ozaki, H.
Author_Institution
Dept. of Electr., Electron. & Comput. Eng., Waseda Univ., Tokyo, Japan
fYear
2002
fDate
25-29 Aug. 2002
Firstpage
110
Lastpage
113
Abstract
A simple preparation method of β-FeSi2 on substrate was proposed by the isothermal heat treatment in an evacuated and sealed ampoule. The mechanism of this reaction process was investigated using compacted Si powder or mixed powder of Fe and Si and sputtered Fe films on Si substrates or sapphire substrates. The compacted powder was encapsulated in an ampoule and separated from substrate with sputtered Fe film. It was found that vaporized Si from Si powder reacted with Fe film to form ε-FeSi, which, in turn, initiated the reaction with Si substrate to form β-FeSi2 film. Furthermore, it was found that vaporized Fe, derived from mixed powder of Fe and Si, promoted the formation of β-FeSi2 single phase on thermally oxidized Si substrate.
Keywords
densification; heat treatment; iron compounds; materials preparation; powder technology; semiconductor growth; semiconductor materials; thermoelectricity; β-FeSi2; Al2O3; FeSi2; Si; isothermal heat treatment; mixed powders; preparation method; sputtered Fe films; Acceleration; Crystallization; Electronic switching systems; Iron; Powders; Semiconductor films; Silicidation; Solids; Substrates; X-ray scattering;
fLanguage
English
Publisher
ieee
Conference_Titel
Thermoelectrics, 2002. Proceedings ICT '02. Twenty-First International Conference on
Print_ISBN
0-7803-7683-8
Type
conf
DOI
10.1109/ICT.2002.1190277
Filename
1190277
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