• DocumentCode
    3337464
  • Title

    Direct formation of β-FeSi2 on substrate in evacuated sealed ampoule

  • Author

    Oikawa, Y. ; Kim, C. ; Ozaki, H.

  • Author_Institution
    Dept. of Electr., Electron. & Comput. Eng., Waseda Univ., Tokyo, Japan
  • fYear
    2002
  • fDate
    25-29 Aug. 2002
  • Firstpage
    110
  • Lastpage
    113
  • Abstract
    A simple preparation method of β-FeSi2 on substrate was proposed by the isothermal heat treatment in an evacuated and sealed ampoule. The mechanism of this reaction process was investigated using compacted Si powder or mixed powder of Fe and Si and sputtered Fe films on Si substrates or sapphire substrates. The compacted powder was encapsulated in an ampoule and separated from substrate with sputtered Fe film. It was found that vaporized Si from Si powder reacted with Fe film to form ε-FeSi, which, in turn, initiated the reaction with Si substrate to form β-FeSi2 film. Furthermore, it was found that vaporized Fe, derived from mixed powder of Fe and Si, promoted the formation of β-FeSi2 single phase on thermally oxidized Si substrate.
  • Keywords
    densification; heat treatment; iron compounds; materials preparation; powder technology; semiconductor growth; semiconductor materials; thermoelectricity; β-FeSi2; Al2O3; FeSi2; Si; isothermal heat treatment; mixed powders; preparation method; sputtered Fe films; Acceleration; Crystallization; Electronic switching systems; Iron; Powders; Semiconductor films; Silicidation; Solids; Substrates; X-ray scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Thermoelectrics, 2002. Proceedings ICT '02. Twenty-First International Conference on
  • Print_ISBN
    0-7803-7683-8
  • Type

    conf

  • DOI
    10.1109/ICT.2002.1190277
  • Filename
    1190277