DocumentCode :
3338939
Title :
Epitaxial wafer equivalent solar cells with overgrown SiO2 layer and varying doping profile to reduce the influence of defects
Author :
Driesen, Marion ; Reber, Stefan
Author_Institution :
Fraunhofer Inst. for Solar Energy Syst. (ISE), Freiburg, Germany
fYear :
2013
fDate :
16-21 June 2013
Abstract :
Epitaxial wafer equivalent solar cells require a reflecting rear side to reach similar efficiencies as wafer based cells. This can be achieved by implementing a SiO2 layer using the epitaxial lateral overgrowth technique. In this work defect structure and density within the silicon layers are discussed. As defect densities rise towards the SiO2 layers, solar cells are fabricated with increasing sizes of moderately doped back surface fields to reduce their influence. Thereby, a benefit of 3 % absolute in efficiency is obtained. However, the best cell with an efficiency of 14.1 % is still limited by the reduced crystal quality.
Keywords :
crystal defects; crystal structure; semiconductor epitaxial layers; silicon compounds; solar cells; thin film devices; SiO2; crystal quality reduction; defect density; defect structure; doping profile variation; epitaxial lateral overgrowth technique; epitaxial wafer equivalent solar cells; rear side reflection; Crystals; Doping; Epitaxial growth; Photovoltaic cells; Silicon; Substrates; Surface treatment; crystalline silicon thin film; defect density; epitaxial lateral overgrowth; epitaxial wafer equivalent;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2013 IEEE 39th
Conference_Location :
Tampa, FL
Type :
conf
DOI :
10.1109/PVSC.2013.6744100
Filename :
6744100
Link To Document :
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