• DocumentCode
    3338939
  • Title

    Epitaxial wafer equivalent solar cells with overgrown SiO2 layer and varying doping profile to reduce the influence of defects

  • Author

    Driesen, Marion ; Reber, Stefan

  • Author_Institution
    Fraunhofer Inst. for Solar Energy Syst. (ISE), Freiburg, Germany
  • fYear
    2013
  • fDate
    16-21 June 2013
  • Abstract
    Epitaxial wafer equivalent solar cells require a reflecting rear side to reach similar efficiencies as wafer based cells. This can be achieved by implementing a SiO2 layer using the epitaxial lateral overgrowth technique. In this work defect structure and density within the silicon layers are discussed. As defect densities rise towards the SiO2 layers, solar cells are fabricated with increasing sizes of moderately doped back surface fields to reduce their influence. Thereby, a benefit of 3 % absolute in efficiency is obtained. However, the best cell with an efficiency of 14.1 % is still limited by the reduced crystal quality.
  • Keywords
    crystal defects; crystal structure; semiconductor epitaxial layers; silicon compounds; solar cells; thin film devices; SiO2; crystal quality reduction; defect density; defect structure; doping profile variation; epitaxial lateral overgrowth technique; epitaxial wafer equivalent solar cells; rear side reflection; Crystals; Doping; Epitaxial growth; Photovoltaic cells; Silicon; Substrates; Surface treatment; crystalline silicon thin film; defect density; epitaxial lateral overgrowth; epitaxial wafer equivalent;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference (PVSC), 2013 IEEE 39th
  • Conference_Location
    Tampa, FL
  • Type

    conf

  • DOI
    10.1109/PVSC.2013.6744100
  • Filename
    6744100