Short-flow test chip utilizing fast testing for defect density monitoring in 45nm

A comprehensive 45 nm short-flow test chip was designed and is currently used to improve defect-limited yield. In a novel development to reduce test time, the DC test structures are tested in parallel mode on a functional test platform, resulting in a 5x reduction in test time over conventional parametric testing. The large critical area enables accurate measurement of defect densities down to the ppb-level, while the reduced cycle time of this short-flow test chip makes it an excellent routine defect monitor as well as a test vehicle for evaluating process changes.