• DocumentCode
    3340953
  • Title

    A study of cross-bridge kelvin resistor structures for reliable measurement of low contact resistances

  • Author

    Stavitski, N. A M ; Klootwijk, J.H. ; van Zeijl, H.W. ; Kovalgin, A.Y. ; Wolters, R.A.M.

  • Author_Institution
    Inst. for Nanotechnol., Univ. of Twente, Enschede
  • fYear
    2008
  • fDate
    24-27 March 2008
  • Firstpage
    199
  • Lastpage
    204
  • Abstract
    The parasitic factors that strongly influence the measurement accuracy of cross-bridge Kelvin resistor (CBKR) structures for low specific contact resistances (pc) have been extensively discussed during last few decades and the minimum of the pc value, which could be accurately extracted, was estimated. We fabricated a set of various metal-to-metal CBKR structures with different geometries, i.e., shapes and dimensions, to confirm this limit experimentally. As a result, a model was developed to account for the actual current flow and a method for reliable pc extraction was created. It was found that in our case of metal-to- metal contacts, the measured CBKR contact resistance was determined by the dimensions of the two-metal stack in the area of contact and sheet resistances of the metals used.
  • Keywords
    contact resistance; resistors; cross-bridge Kelvin resistor; current flow; low contact resistance; metal sheet resistance; parasitic factor; Electrical resistance measurement; Kelvin; Microelectronics; Resistors; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronic Test Structures, 2008. ICMTS 2008. IEEE International Conference on
  • Conference_Location
    Edinburgh
  • Print_ISBN
    978-1-4244-1800-8
  • Electronic_ISBN
    978-1-4244-1801-5
  • Type

    conf

  • DOI
    10.1109/ICMTS.2008.4509338
  • Filename
    4509338