• DocumentCode
    3341160
  • Title

    Improvement of excess-carrier lifetime in BaSi2 epitaxial films by post-growth annealing

  • Author

    Hara, Kosuke O. ; Usami, Noritaka ; Nakamura, Kentaro ; Takabe, Ryouta ; Baba, M. ; Toko, Kiyoshi ; Suemasu, Takashi

  • Author_Institution
    Grad. Sch. of Eng., Nagoya Univ., Nagoya, Japan
  • fYear
    2013
  • fDate
    16-21 June 2013
  • Abstract
    We have found that post-growth annealing of BaSi2 epitaxial films drastically modifies carrier-recombination kinetics. In fact, the 1/e decay time of excess carriers in 1640-nm-thick BaSi2 film annealed at 800 °C is 0.86 μs, which is much longer than that in the as-grown film (0.015 μs). Possible reason for the lifetime increase is discussed from the viewpoint of strain relaxation. The increased lifetime permits us to extract the minority-carrier lifetime from the injection-level dependence of apparent lifetime, which is up to 11 μs in the annealed films. This long lifetime confirms that earth-abundant BaSi2 is promising for thin-film solar cells.
  • Keywords
    annealing; barium compounds; carrier lifetime; epitaxial layers; minority carriers; solar cells; carrier-recombination kinetics; epitaxial film; excess-carrier lifetime improvement; injection-level dependence; minority-carrier lifetime; post-growth annealing; size 1640 nm; strain relaxation; temperature 800 degC; thin-film solar cell; Annealing; Charge carrier lifetime; Molecular beam epitaxial growth; Silicon; Strain; Substrates; barium compounds; charge carrier lifetime; epitaxial layers; semiconductor films; silicides;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference (PVSC), 2013 IEEE 39th
  • Conference_Location
    Tampa, FL
  • Type

    conf

  • DOI
    10.1109/PVSC.2013.6744211
  • Filename
    6744211