DocumentCode :
3341285
Title :
Large area multicrystalline silicon buried contact solar cells with bulk passivation and an efficiency of 17.5%
Author :
Jooss, W. ; Fath, P. ; Bucher, E. ; Roberts, S. ; Bruton, T.M.
Author_Institution :
Dept. of Phys., Univ. of Konstanz, Germany
fYear :
2002
fDate :
19-24 May 2002
Firstpage :
202
Lastpage :
205
Abstract :
The purpose of this study was the development of a processing sequence for buried contact solar cells on multicrystalline silicon (mc-Si). The applied process includes mechanical V-texturing for the reduction of reflection losses as well as bulk passivation by a remote hydrogen plasma source. Record high efficiencies of 17.5% (V=628 mV, Jsc=36.3 mA/cm2, FF=76.8%, independently confirmed at FhG-ISE) have been obtained on Polix mc-Si on a solar cell area of 144 cm2. The high Jsc results from low shadowing and reflection losses, high bulk diffusion lengths and from a selective emitter structure. Hydrogenation was investigated for Baysix mc-Si and led to an increase in V of 5-11 mV and in Jsc of 0.3-0.6 mA/cm2, which were caused by an increase in the effective diffusion length of 40-50 μm. It has been demonstrated, that hydrogenation from a PECVD SiNx layer applied to screen printed solar cells could be more effective than remote plasma hydrogenation in BCSCs.
Keywords :
carrier lifetime; hydrogenation; passivation; plasma CVD coatings; semiconductor device measurement; silicon; silicon compounds; solar cells; texture; thick films; 17.5 percent; 40 to 50 micron; 628 mV; PECVD SiNx layer; Si-SiN; bulk diffusion length; bulk passivation; efficiency; hydrogenation; large area multicrystalline silicon buried contact solar cells; mc-Si; mechanical V-texturing; reflection loss; screen printed solar cells; Costs; Crystalline materials; Hydrogen; Manufacturing; Passivation; Photovoltaic cells; Plasma materials processing; Reflection; Silicon compounds; Surface resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 2002. Conference Record of the Twenty-Ninth IEEE
ISSN :
1060-8371
Print_ISBN :
0-7803-7471-1
Type :
conf
DOI :
10.1109/PVSC.2002.1190491
Filename :
1190491
Link To Document :
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