DocumentCode
3341306
Title
An equivalent circuit model for high-k/metal gate stack MOS capacitor with dynamic leakage
Author
Sohn, Chang-Woo ; Jeong, Eui-Young ; Sagong, Hyun Chul ; Choi, Do-Young ; Park, Min Sang ; Kang, Chang Yong ; Chung, Jinyong ; Jeong, Yoon-Ha
Author_Institution
Dept. of Electron. & Electr. Eng., Pohang Univ. of Sci. & Technol., Pohang, South Korea
fYear
2010
fDate
12-15 Oct. 2010
Firstpage
291
Lastpage
294
Abstract
This paper presents a simple equivalent circuit model to characterize a gate impedance of MOS capacitor with high-k dielectric, which exhibited significant dynamic leakage. Series of RC-shunts was added to consider the effects of charge trapping in high-k dielectric. From our model, it is found that two-frequency method using the megahertz range gives us reasonable values for the gate capacitance because the traps with large time constants are unable to response the modulating frequency. Also, parameters for our model are systematically analyzed.
Keywords
MOS capacitors; equivalent circuits; high-k dielectric thin films; semiconductor device models; RC-shunts; charge trapping; dynamic leakage; equivalent circuit model; gate impedance; high-k dielectric; high-k-metal gate stack MOS capacitor; megahertz range; two-frequency method; Capacitance; Dielectrics; Frequency measurement; Integrated circuit modeling; Logic gates; MOS capacitors; Voltage measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology Materials and Devices Conference (NMDC), 2010 IEEE
Conference_Location
Monterey, CA
Print_ISBN
978-1-4244-8896-4
Type
conf
DOI
10.1109/NMDC.2010.5651924
Filename
5651924
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