DocumentCode :
3341306
Title :
An equivalent circuit model for high-k/metal gate stack MOS capacitor with dynamic leakage
Author :
Sohn, Chang-Woo ; Jeong, Eui-Young ; Sagong, Hyun Chul ; Choi, Do-Young ; Park, Min Sang ; Kang, Chang Yong ; Chung, Jinyong ; Jeong, Yoon-Ha
Author_Institution :
Dept. of Electron. & Electr. Eng., Pohang Univ. of Sci. & Technol., Pohang, South Korea
fYear :
2010
fDate :
12-15 Oct. 2010
Firstpage :
291
Lastpage :
294
Abstract :
This paper presents a simple equivalent circuit model to characterize a gate impedance of MOS capacitor with high-k dielectric, which exhibited significant dynamic leakage. Series of RC-shunts was added to consider the effects of charge trapping in high-k dielectric. From our model, it is found that two-frequency method using the megahertz range gives us reasonable values for the gate capacitance because the traps with large time constants are unable to response the modulating frequency. Also, parameters for our model are systematically analyzed.
Keywords :
MOS capacitors; equivalent circuits; high-k dielectric thin films; semiconductor device models; RC-shunts; charge trapping; dynamic leakage; equivalent circuit model; gate impedance; high-k dielectric; high-k-metal gate stack MOS capacitor; megahertz range; two-frequency method; Capacitance; Dielectrics; Frequency measurement; Integrated circuit modeling; Logic gates; MOS capacitors; Voltage measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology Materials and Devices Conference (NMDC), 2010 IEEE
Conference_Location :
Monterey, CA
Print_ISBN :
978-1-4244-8896-4
Type :
conf
DOI :
10.1109/NMDC.2010.5651924
Filename :
5651924
Link To Document :
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