DocumentCode :
3341313
Title :
Two-power-law relaxation processes in semiconductors possessing metastable defects
Author :
Jurlewicz, Agnieszka ; Trzmiel, Justyna
Author_Institution :
Hugo Steinhaus Center, Wroclaw Univ. of Technol., Wrocław, Poland
fYear :
2013
fDate :
June 30 2013-July 4 2013
Firstpage :
576
Lastpage :
579
Abstract :
In this paper the two-power-law relaxation behavior of semiconducting materials possessing deep, metastable defects is analyzed in terms of a model leading to new power-law relaxation pattern being a mixture of the generalized Mittag-Leffler (GML) and Havriliak-Negami (HN) responses, which enlarges the class of physically well grounded fitting functions. Applying the probabilistic representation of the relaxation decay, we show that such a mixture can be derived from an extension of the stochastic model of correlated clusters.
Keywords :
dielectric relaxation; semiconductor materials; stochastic processes; GML response; HN response; Havriliak-Negami response; generalized Mittag-Leffler response; metastable defects; physically-well-grounded fitting function; power-law relaxation pattern; probabilistic representation; relaxation decay; semiconducting materials; semiconductor; stochastic model; two-power-law relaxation process; Conferences; Dielectrics; Indium; Random variables; Solids; Stochastic processes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid Dielectrics (ICSD), 2013 IEEE International Conference on
Conference_Location :
Bologna
ISSN :
2159-1687
Print_ISBN :
978-1-4799-0807-3
Type :
conf
DOI :
10.1109/ICSD.2013.6619740
Filename :
6619740
Link To Document :
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