Influence of poling field on polymerization in polyurea thin films by vapor deposition polymerization

Author

Segi, Takeshi ; Suzuoki, Yasuo ; Tabata, Akimori ; Mizutani, Teruyoshi ; Takagi, Katsuhiko

Author_Institution

Dept. of Electr. Eng., Nagoya Univ., Japan

fYear

1996

fDate

25-30 Sep 1996

Firstpage

456

Lastpage

461

Abstract

Using 4,4´-diphenylmethane diisocyanate (MDI) and p-diamino nitro benzene (DNB), polyurea (PU(DNB)) films were fabricated by vapor deposition polymerization for second-order nonlinear optical application. In PU(DNB), although the enhanced optical nonlinearity due to the introduction of the NO₂ group was achieved, a drastic decay of SH intensity was observed at 200°C. The structural analysis revealed that the polymerization proceeded during the heat treatment but not during the poling process. This is attributed to the hindrance to the polymerization due to the reduction of reactivity of the NH₂ group under the poling field

Keywords

optical films; optical harmonic generation; optical polymers; polymer films; polymerisation; vapour deposited coatings; 200 C; 4,4´-diphenylmethane diisocyanate; DNB; MDI; PU(DNB); SH intensity; heat treatment; p-diamino nitro benzene; poling field; polyurea thin film; second-order optical nonlinearity; structural analysis; vapor deposition polymerization; Chemical vapor deposition; Glass; Heat treatment; Nonlinear optics; Optical attenuators; Optical films; Optical polymers; Polymer films; Sputtering; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Electrets, 1996. (ISE 9), 9th International Symposium on

Conference_Location

Shanghai

Print_ISBN

0-7803-2695-4

Type

conf

DOI

10.1109/ISE.1996.578129

Filename

578129