DocumentCode
3341962
Title
Selective junction separation techniques for multi-crystalline silicon solar cells
Author
De Wolf, S. ; Agostinelli, G. ; Allebé, C. ; Van Kerschaver, E. ; Szlufcik, J.
Author_Institution
Dept. of Electron. Eng., Katholieke Univ., Leuven, Belgium
fYear
2002
fDate
19-24 May 2002
Firstpage
320
Lastpage
323
Abstract
This paper addresses the need for new junction separation techniques that are low-cost, selective, have a high throughput and high-yield. Pre- as well as post-diffusion selective approaches as integrated into an existing low cost screenprinted metallisation processing scheme are discussed and compared to state-of-the-art technology.
Keywords
diffusion barriers; elemental semiconductors; metallisation; silicon; solar cells; thick films; Si; diffusion selective approaches; multi-crystalline silicon solar cells; screenprinted metallisation processing; selective junction separation techniques; Contacts; Costs; Etching; Metallization; Photovoltaic cells; Plasma applications; Plasma displays; Production facilities; Silicon; Throughput;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 2002. Conference Record of the Twenty-Ninth IEEE
ISSN
1060-8371
Print_ISBN
0-7803-7471-1
Type
conf
DOI
10.1109/PVSC.2002.1190523
Filename
1190523
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