DocumentCode :
3342106
Title :
Light induced degradation in Czochralski silicon during illuminated high temperature processing
Author :
Damiani, Ben ; Hilali, Mohamed ; Rohatgi, Ajeet
Author_Institution :
Univ. Center of Excellence for Photovoltaics; Res., Georgia Inst. of Technol., Atlanta, GA, USA
fYear :
2002
fDate :
19-24 May 2002
Firstpage :
348
Lastpage :
351
Abstract :
Traditional Czochralski grown Si solar cells are known to suffer from light induced degradation (LID). The defect responsible for the LID is known to anneal out at temperatures above 200°C in the dark. This paper shows for the first time that bulk lifetime in boron doped Cz Si also degrades at 400°C and 600°C under lamp illumination in a belt furnace. In addition, both degradation and annealing mechanisms are shown to be active for the same RTP heating cycle at 200°C. As a result, a Cz Si sample can be annealed from 25i s to 44i s and degraded from a 180i s down to a 45i s effective lifetime. The bulk lifetime is fully recovered at temperatures above 300°C in the RTP and above 600°C in a belt furnace because defect annealing rate exceeds the defect formation rate. On the other hand bulk lifetime is annealed in a conventional furnace at temperatures above 200°C with no lamp illumination.
Keywords :
boron; elemental semiconductors; rapid thermal annealing; silicon; solar cells; 200 degC; 300 degC; 400 degC; 600 degC; Cz Si; Czochralski silicon; Si solar cells; Si:B; annealing; bulk lifetime; illuminated high temperature processing; lamp illumination; light induced degradation; Annealing; Belts; Boron; Degradation; Furnaces; Lamps; Lighting; Photovoltaic cells; Silicon; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 2002. Conference Record of the Twenty-Ninth IEEE
ISSN :
1060-8371
Print_ISBN :
0-7803-7471-1
Type :
conf
DOI :
10.1109/PVSC.2002.1190530
Filename :
1190530
Link To Document :
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