• DocumentCode
    3342879
  • Title

    Preparation of highly effective p-Bi0.5Sb1.5Te3 and n-Bi2Te2.7Se0.3 films

  • Author

    Stölzer, M. ; Stordeur, M. ; Stark, I.

  • Author_Institution
    Martin-Luther-Univ., Halle-Wittenberg, Germany
  • fYear
    1996
  • fDate
    26-29 March 1996
  • Firstpage
    445
  • Lastpage
    449
  • Abstract
    Bi/sub 0.5/Sb/sub 1.5/Te/sub 3/ and B2/sub i/Te/sub 2.7/Se/sub 0.3/ films were flash-evaporated onto oxidized aluminium and Kapton foil substrates. The films were characterized by SEM, EDX and electrical transport measurements (electrical conductivity, Hall coefficient and thermopower in the range 85...375 K). Highly effective films grown on Kapton show a (1 0 5) texture whereas films on Al/Al/sub 2/O/sub 3/ are (0 0 n) texturized. With an optimal amount of excess Te in the evaporant, after an annealing procedure a power factor of 4E-3 W K(E-2) m(E-1) at 300 K was reached.
  • Keywords
    Hall effect; X-ray chemical analysis; annealing; bismuth compounds; electrical conductivity; scanning electron microscopy; semiconductor thin films; thermoelectric power; vapour deposited coatings; 85 to 375 K; Bi/sub 0.5/Sb/sub 1.5/Te/sub 3/; Bi/sub 2/Te/sub 2.7/Se/sub 0.3/; EDX; Hall coefficient; SEM; annealing; electrical conductivity; electrical transport; flash-evaporated; n-Bi/sub 2/Te/sub 2.7/Se/sub 0.3/ film; p-Bi/sub 0.5/Sb/sub 1.5/Te/sub 3/ film; power factor; thermopower; Bismuth; Composite materials; Conducting materials; Semiconductor films; Substrates; Tellurium; Temperature; Thermal conductivity; Thermal expansion; Thermoelectricity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Thermoelectrics, 1996., Fifteenth International Conference on
  • Conference_Location
    Pasadena, CA, USA
  • Print_ISBN
    0-7803-3221-0
  • Type

    conf

  • DOI
    10.1109/ICT.1996.553524
  • Filename
    553524