DocumentCode
3343777
Title
Improved Cu/Mo back contact for CdS/CdTe solar cells
Author
Pena, Juan Luis ; Hernandez, L. ; Rejon, Victor
Author_Institution
Appl. Phys. Dept., CINVESTAV-IPN, Mérida, Mexico
fYear
2013
fDate
16-21 June 2013
Firstpage
1165
Lastpage
1167
Abstract
The simple back contact Cu (10 nm)/Mo (500 nm) gives low series resistance when the CdTe surface is both smooth and grain size is up to 5 μm, for this case the solar cell efficiency is typically around 8-12%. There are cases where the CdTe surface have an opposite characteristics, in these cases the series resistance is too high, it produces poor fill factor and efficiency. It can be drastically improved at 11.0% by using multilayer Cu/Mo/Cu/Mo without degrading the Jsc and Voc values. The improved efficiency is due to an important change in the fill factor via lowering the series resistance. The solar cells were fabricated using ITO/ZnO/CdS/CdTe layers. The ZnO, CdS, Cu and Mo films were deposited by rf-sputtering. The CdTe film was grown by conventional CSS technique. The cells were activated by using CHClF2-argon-oxygen gases.
Keywords
II-VI semiconductors; cadmium compounds; copper; electrical contacts; indium compounds; molybdenum; solar cells; sputter deposition; thin film devices; wide band gap semiconductors; zinc compounds; CHClF2-argon-oxygen gas; CSS technique; Cu-Mo; ITO-ZnO-CdS-CdTe; RF-sputtering; back contact; deposition; efficiency 8 percent to 12 percent; fill factor; series resistance; size 10 nm; size 500 nm; solar cell efficiency; Films; Grain size; Nonhomogeneous media; Photovoltaic cells; Surface resistance; Surface treatment; Activation process; Back contact; CdS/CdTe solar cells; annealing process;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference (PVSC), 2013 IEEE 39th
Conference_Location
Tampa, FL
Type
conf
DOI
10.1109/PVSC.2013.6744346
Filename
6744346
Link To Document