Title :
Notice of Retraction
Effects of Monosulfuron on Photosynthetic Pigments of Anabaena flos-aquae Breb. Exposed to Different N-Content
Author :
Jianying Shen ; Gaoyi Ye ; Jun Yang ; Wenyu Lu
Author_Institution :
Sch. of Agric. & Biol., Shanghai Jiaotong Univ., Shanghai, China
Abstract :
Notice of Retraction
After careful and considered review of the content of this paper by a duly constituted expert committee, this paper has been found to be in violation of IEEE´s Publication Principles.
We hereby retract the content of this paper. Reasonable effort should be made to remove all past references to this paper.
The presenting author of this paper has the option to appeal this decision by contacting TPII@ieee.org.
The effects of monosulfuron on growth and photosynthetic pigments of the nitrogen-fixing cyanobacterium Anabaena flos-aquae grown mixotrophically exposed to 0.05, 0.20, and 0.80 mg/L N-content were studied. Exposed to three N content, the five concentrations of monosulfuron tested can significantly inhibit algal growth in a dose-dependent manner. The growth rate were decreased with the increase in monosulfuron concentration, and A. flos-aquae had different degrees of sensitivity to monosulfuron with the most sensitive N-content being 0.80 mg/L followed by 0.20 and 0.05 mg/L. The herbicide monosulfuron appeared to have markedly inhibition effects on the synthesis of photosynthetic pigments. The chlorophyll a, caroteniod, and biliprotein appeared to tackle monosulfuron concentration and N-content.
Keywords :
geochemistry; microorganisms; nitrogen; pigments; soil pollution; N2; algal growth inhibition; herbicide monosulfuron; inhibition effect; monosulfuron concentration; monosulfuron effect; nitrogen-fixing cyanobacterium anabaena flos-aquae; photosynthetic pigment growth; photosynthetic pigment synthesis; sensitivity degree; Agriculture; Algae; Carbon; Nitrogen; Pigments; Sensitivity; Soil;
Conference_Titel :
Bioinformatics and Biomedical Engineering, (iCBBE) 2011 5th International Conference on
Conference_Location :
Wuhan
Print_ISBN :
978-1-4244-5088-6
DOI :
10.1109/icbbe.2011.5781440