DocumentCode
3344348
Title
Microstructure of nanocrystalline titanium dioxide thin films deposited on silicon
Author
Domaradzki, J. ; Prociow, E.L. ; Kaczmarek, D. ; Mielcarek, W.
fYear
2004
fDate
17-21 Oct. 2004
Firstpage
119
Lastpage
122
Abstract
In present paper results of structural investigations of thin films of titanium dioxide (TiD;) manufactured by modified magnetron sputtering process have been outlined XRD studies have shown that application of monocrystalline silicon wafers ensured fabrication of thin films with a high quality nanocrystalline structure with average size of grains in the range of (20 -i- 50) nm. It was stated that thin films fabricated by the modified method of magnetron sputtering were contracted at some preferred directions.
Keywords
Amorphous magnetic materials; Dielectric thin films; Manufacturing processes; Microstructure; Optical sensors; Semiconductor thin films; Silicon; Sputtering; Titanium; X-ray scattering;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Devices and Microsystems, 2004. ASDAM 2004. The Fifth International Conference on
Conference_Location
Smolenice Castle, Slovakia
Print_ISBN
0-7803-8335-7
Type
conf
DOI
10.1109/ASDAM.2004.1441174
Filename
1441174
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