• DocumentCode
    3344440
  • Title

    Interface properties of group III-nitrides and their importance for electronic devices

  • Author

    Luth, H.

  • fYear
    2004
  • fDate
    17-21 Oct. 2004
  • Firstpage
    131
  • Lastpage
    137
  • Abstract
    Electronic interface properties play an essential role for the performance of semiconductor devices. In this context the present short review discusses - mainly in connection with RF high mobility transistors (HEMTs) - aspects of surface morphology and growth conditions, electronic interface charges arising from bulk polarisation and suiface states, band offsets and Schottky barriers as well as surface passivation of group Ill-nitrides.
  • Keywords
    Aluminum gallium nitride; Epitaxial growth; Epitaxial layers; Gallium nitride; HEMTs; MODFETs; Molecular beam epitaxial growth; Nanoscale devices; Semiconductor devices; Surface morphology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Devices and Microsystems, 2004. ASDAM 2004. The Fifth International Conference on
  • Conference_Location
    Smolenice Castle, Slovakia
  • Print_ISBN
    0-7803-8335-7
  • Type

    conf

  • DOI
    10.1109/ASDAM.2004.1441177
  • Filename
    1441177