DocumentCode
3344440
Title
Interface properties of group III-nitrides and their importance for electronic devices
Author
Luth, H.
fYear
2004
fDate
17-21 Oct. 2004
Firstpage
131
Lastpage
137
Abstract
Electronic interface properties play an essential role for the performance of semiconductor devices. In this context the present short review discusses - mainly in connection with RF high mobility transistors (HEMTs) - aspects of surface morphology and growth conditions, electronic interface charges arising from bulk polarisation and suiface states, band offsets and Schottky barriers as well as surface passivation of group Ill-nitrides.
Keywords
Aluminum gallium nitride; Epitaxial growth; Epitaxial layers; Gallium nitride; HEMTs; MODFETs; Molecular beam epitaxial growth; Nanoscale devices; Semiconductor devices; Surface morphology;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Devices and Microsystems, 2004. ASDAM 2004. The Fifth International Conference on
Conference_Location
Smolenice Castle, Slovakia
Print_ISBN
0-7803-8335-7
Type
conf
DOI
10.1109/ASDAM.2004.1441177
Filename
1441177
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