Smooth GaN recess wet photoelectrochemical etching

Author

Gregusova, D. ; Novák, J. ; Hardtdegen, H. ; Soltys, J. ; Kostic, I. ; Gregus, J. ; Kordos, P.

fYear

2004

fDate

Oct. 17-21, 2004

Firstpage

199

Lastpage

202

Keywords

Contacts; Electrons; Gallium nitride; Oxidation; Photoconductivity; Rough surfaces; Surface roughness; Temperature; Topology; Wet etching;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Devices and Microsystems, 2004. ASDAM 2004. The Fifth International Conference on

Print_ISBN

0-7803-8335-7

Type

DOI

10.1109/ASDAM.2004.1441194

Filename

1441194

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