DocumentCode :
3344792
Title :
All silicon carbide based p-i-n photovoltaic solar cells with conversion efficiency enhanced by detuning the composition ratio of i-SixC1−x layer
Author :
Chih-Hsien Cheng ; Ling-Hsuan Tasi ; Gong-Ru Lin
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
fYear :
2013
fDate :
16-21 June 2013
Firstpage :
1343
Lastpage :
1345
Abstract :
All silicon carbide (SixC1-x) based p-i-n photovoltaic solar cells (PVSCs) is demonstrated by growing the non-stoichiometric Si-rich SixC1-x films with plasma enhanced chemical vapor deposition (PECVD). With decreasing the CH4/(CH4+SiH4) fluence ratio from 50% to 30%, the Si/C composition ratio of the Si-rich SixC1-x film increases from 1.99 to 2.78. For the Si-rich Si0.74C0.26 film, the broadband absorption spectrum shows the highest optical absorption coefficient of up to 1.9×105 cm-1. The ITO/p-SixC1-x/i-SixC1-x/n-SixC1-x/Al solar cell provides the conversion efficiency and filling factor enhancing from 1.41% to 2% and from 23.1% to 25.6%, respectively, by enlarging the Si/C composition ratio of i-SixC1-x layer from 1.99 to 2.78.
Keywords :
absorption coefficients; aluminium; indium compounds; plasma CVD; semiconductor growth; semiconductor thin films; silicon compounds; solar cells; stoichiometry; tin compounds; wide band gap semiconductors; ITO-SixC1-x-SixC1-x-SixC1-x-Al; PECVD; broadband absorption spectrum; filling factor; nonstoichiometric film; optical absorption coefficient; plasma enhanced chemical vapor deposition; silicon carbide based p-i-n photovoltaic solar cells; Absorption; Films; Photovoltaic cells; Plasmas; Resistance; Silicon; Silicon carbide; photovoltaic cells; plasma enhanced chemical vapor deposition; silicon carbide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2013 IEEE 39th
Conference_Location :
Tampa, FL
Type :
conf
DOI :
10.1109/PVSC.2013.6744391
Filename :
6744391
Link To Document :
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