DocumentCode :
3345632
Title :
Nanoindentation of single crystal and polycrystalline copper nanowires
Author :
Bansal, S. ; Toimil-Molares, E. ; Saxena, A. ; Tummala, Rao R.
Author_Institution :
Microsystems Packaging Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
fYear :
2005
fDate :
31 May-3 June 2005
Firstpage :
71
Abstract :
Metal nanowires are attracting considerable interest because of their potential importance to the technology of miniaturization of electronic devices in need of metallic contacts. One of the important attributes of nanowires is their potentially high mechanical strength. Nanoindentation is the most realistic tool at the present time to determine the mechanical properties of nanowires. The load-displacement behavior during nanoindentation of electrodeposited single crystal and 500 nm diameter polycrystalline copper nanowires was performed and the results are reported in this paper. The behavior has also been compared with that of bulk nanocrystalline and annealed copper. The hardness values for 50 nm grain size polycrystalline nanowires and those of extruded bulk 50 nm grain size copper were comparable, 2.1 GPa, and that of a 50 nm single crystal copper nanowire was 1.8 GPa.
Keywords :
electroplated coatings; grain size; hardness; indentation; integrated circuit metallisation; nanowires; 1.8 GPa; 2.1 GPa; 50 nm; 500 nm; Cu; load-displacement behavior; mechanical property; mechanical strength; metallic contacts; nanoindentation; nanowires; Copper; Crystalline materials; Fabrication; Gold; Grain size; Mechanical factors; Nanostructured materials; Nanowires; Plastics; Sensor arrays;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference, 2005. Proceedings. 55th
ISSN :
0569-5503
Print_ISBN :
0-7803-8907-7
Type :
conf
DOI :
10.1109/ECTC.2005.1441248
Filename :
1441248
Link To Document :
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