Title :
Microstructurally engineered p-layers for obtaining high open-circuit voltages in a-Si:H n-i-p solar cells
Author :
Koval, R.J. ; Pearce, J.M. ; Chen, Chi ; Ferreira, G.M. ; Ferlauto, A.S. ; Collins, R.W. ; Wronski, C.R.
Author_Institution :
Center for Thin Film Devices, Pennsylvania State Univ., University Park, PA, USA
Abstract :
A study was carded out with the goal of obtaining high open circuit voltages (Voc) in a-Si:H n-i-p solar cells, taking into account the evolutionary nature of the microstructure of the p-layers during growth. It is found that cells with players in the protocrystalline Si:H growth regime give the highest values of Voc not those with microcrystalline Si:H p-layers. Evidence for this conclusion is presented whereby Voc is related directly to the microstructure of the p-layers, as characterized using spectroscopic ellipsometry, atomic force microscopy, and electrical measurements. The results clarify the origins of (i) inconsistencies associated with attributing high Voc in n-i-p cells to the microcrystallinity of the p-layers, as well as (ii) the inability to obtain similarly high values in p-i-n superstrate cells. Because the microstructure of p-type protocrystalline Si:H depends on that of the underlying i-layer, it is not possible to optimize the cell parameters based on an understanding of the process unless detailed characterization of the p-layer in the actual cell configuration is performed.
Keywords :
amorphous semiconductors; atomic force microscopy; elemental semiconductors; ellipsometry; hydrogen; semiconductor device measurement; silicon; solar cells; Si:H; a-Si:H n-i-p solar cells; atomic force microscopy; electrical measurements; microstructurally engineered p-layers; microstructure; open-circuit voltage; spectroscopic ellipsometry; Atomic force microscopy; Atomic measurements; Circuits; Electric variables measurement; Ellipsometry; Force measurement; Microstructure; Photovoltaic cells; Spectroscopy; Voltage;
Conference_Titel :
Photovoltaic Specialists Conference, 2002. Conference Record of the Twenty-Ninth IEEE
Print_ISBN :
0-7803-7471-1
DOI :
10.1109/PVSC.2002.1190795