DocumentCode
3346383
Title
High Aspect Ratio Through-Wafer Interconnect for Three Dimensional Integrated Circuits
Author
Ranganathan, N. ; Prasad, K. ; Balasubramanian, N. ; Qiaoer, Zhou ; Hwee, Seah Chin
fYear
2005
fDate
May 31 2005-June 3 2005
Firstpage
343
Lastpage
348
Keywords
Copper; Electronic components; Etching; Integrated circuit interconnections; Integrated circuit technology; Microelectronics; Power system interconnection; Silicon; Ultra large scale integration; Wafer bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 2005. Proceedings. 55th
Conference_Location
Lake Buena Vista, FL
ISSN
0569-5503
Print_ISBN
0-7803-8907-7
Type
conf
DOI
10.1109/ECTC.2005.1441289
Filename
1441289
Link To Document