Title :
Profile-Free Copper Foil for High-Density Packaging Substrates and High-Frequency Applications
Author :
Ogawa, Nobuyuki ; Onozeki, Hitoshi ; Moriike, N. ; Tanabe, Takahiro ; Kumakura, Toshihisa
Author_Institution :
Center of R&D, Hitachi Chem. Co., Ltd., Ibaraki
fDate :
May 31 2005-June 3 2005
Abstract :
A new profile-free copper foil has been developed whose surface roughness is Rz <1.5 mum with satisfactory adhesion strength. An original surface treatment provided affords good peel strength (0.7 kN/m or more) equivalent to that for the conventional roughened foil with sufficient reliability. With the new profile-free copper foil, the conventional subtractive method is applicable to the wiring of 60 mum pitch or less, and the short-circuit fault of electroless Ni/Pd/Au plating that is prone to occur in fine wiring could be restrained since the wiring is formed on a smooth surface. Moreover, the transmission loss at 5 GHz band is decreased by 8 dB/m since the surface roughness of the conductor line is suppressed
Keywords :
adhesion; circuit reliability; copper alloys; electronics packaging; foils; gold alloys; nickel alloys; palladium alloys; printed circuits; surface roughness; surface treatment; wiring; Au; Ni; Ni-Pd-Au; Pd; adhesion strength; electroless plating; high-density packaging substrates; high-frequency applications; peel strength; profile-free copper foil; short-circuit fault restraint; subtractive method; surface roughness; surface treatment; Adhesives; Conductors; Copper; Gold; Packaging; Propagation losses; Rough surfaces; Surface roughness; Surface treatment; Wiring;
Conference_Titel :
Electronic Components and Technology Conference, 2005. Proceedings. 55th
Conference_Location :
Lake Buena Vista, FL
Print_ISBN :
0-7803-8907-7
DOI :
10.1109/ECTC.2005.1441305