• DocumentCode
    3348184
  • Title

    Third-order susceptibility measurement in silica-based thin film by Zernicke imaging technique

  • Author

    Boudebs, G. ; Chis, M. ; Monteil, A. ; Ferradi, M.

  • Author_Institution
    Lab. des Proprietes Opt. des Mater. et Applications, Univ. d´Angers, France
  • fYear
    1992
  • fDate
    23-28 May 1992
  • Firstpage
    124
  • Abstract
    Summary form only given. It has been shown that the modification undergone by the image given by a Young two-slit object in a 4-f system, in presence of a nonlinear medium, can be used to measure the nonlinear refractive index n/sub 2/ in various materials. Experimental and theoretical descriptions are reported in detail. Here, we give a brief summary of this method, the so-called Zernicke imaging technique (ZIT).
  • Keywords
    light interference; nonlinear optical susceptibility; optical films; optical focusing; optical images; refractive index measurement; silicon compounds; 4-f system; Young two-slit object; Zernicke imaging technique; nonlinear medium; nonlinear refractive index measurement; silica-based thin film; third-order susceptibility measurement; Absorption; Contracts; Diffraction gratings; Energy management; Laboratories; Laser ablation; Refractive index; Substrates; Transistors; Wavelength measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quantum Electronics and Laser Science Conference, 1999. QELS '99. Technical Digest. Summaries of Papers Presented at the
  • Conference_Location
    Baltimore, MD, USA
  • Print_ISBN
    1-55752-576-X
  • Type

    conf

  • DOI
    10.1109/QELS.1999.807408
  • Filename
    807408