DocumentCode
3348184
Title
Third-order susceptibility measurement in silica-based thin film by Zernicke imaging technique
Author
Boudebs, G. ; Chis, M. ; Monteil, A. ; Ferradi, M.
Author_Institution
Lab. des Proprietes Opt. des Mater. et Applications, Univ. d´Angers, France
fYear
1992
fDate
23-28 May 1992
Firstpage
124
Abstract
Summary form only given. It has been shown that the modification undergone by the image given by a Young two-slit object in a 4-f system, in presence of a nonlinear medium, can be used to measure the nonlinear refractive index n/sub 2/ in various materials. Experimental and theoretical descriptions are reported in detail. Here, we give a brief summary of this method, the so-called Zernicke imaging technique (ZIT).
Keywords
light interference; nonlinear optical susceptibility; optical films; optical focusing; optical images; refractive index measurement; silicon compounds; 4-f system; Young two-slit object; Zernicke imaging technique; nonlinear medium; nonlinear refractive index measurement; silica-based thin film; third-order susceptibility measurement; Absorption; Contracts; Diffraction gratings; Energy management; Laboratories; Laser ablation; Refractive index; Substrates; Transistors; Wavelength measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics and Laser Science Conference, 1999. QELS '99. Technical Digest. Summaries of Papers Presented at the
Conference_Location
Baltimore, MD, USA
Print_ISBN
1-55752-576-X
Type
conf
DOI
10.1109/QELS.1999.807408
Filename
807408
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