Title :
2-photon 3-D lithography
Author :
Perry, Joseph W.
Author_Institution :
Dept. of Chem., Arizona Univ., Tucson, AZ, USA
Abstract :
Summary form only given. Recent advances in the development of highly sensitive two-photon photoactive materials and their application in 3D lithographic microfabrication will be presented.
Keywords :
micro-optics; optical fabrication; optical materials; photolithography; sensitivity; two-photon processes; 2-photon 3D lithography; 3D lithographic microfabrication; highly sensitive two-photon photoactive materials; Bleaching; Fluorescence; Laser mode locking; Lithography; Memory; Microscopy; Optical materials; Optical polymers; Optical sensors; Photobleaching;
Conference_Titel :
Quantum Electronics and Laser Science Conference, 1999. QELS '99. Technical Digest. Summaries of Papers Presented at the
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-576-X
DOI :
10.1109/QELS.1999.807433
