Title :
Acid Etch Study of Vertically Aligned Carbon Nanofibers (VACNFs)
Author :
Dong, Zhuxin ; Wejinya, Uchechukwu C. ; Chalamalasetty, Siva Naga Sandeep ; Margis, Mathew R. ; Duensing, Theodore G.
Author_Institution :
Dept. of Mech. Eng., Univ. of Arkansas, Fayetteville, AR, USA
Abstract :
One of the major limitations in the development of ultrasensitive electrochemical biosensors based on one dimensional nanostructures is the difficulty involved with uniform growth of the nanofibers. Fabrication of the Vertically Aligned Carbon Nano Fibers (VACNFs) involve treatment of several chemicals including a variety of etchants. In previous work, successful measurement and characterization of electron beam patterned VACNFs is demonstrated using Atomic Force Microscopy. Also the effect of most commonly used etchant i.e. HF is studied. In this paper, the effect of acid etching on VACNFs is observed and characterized using a highly sensitive and precise Atomic Force Microscopy (AFM). Furthermore, statistical analysis is performed on AFM data to demonstrate data confidence and verify experiments.
Keywords :
atomic force microscopy; carbon fibres; etching; nanofabrication; nanofibres; statistical analysis; AFM; C; acid etching; atomic force microscopy; electron beam; one dimensional nanostructures; statistical analysis; ultrasensitive electrochemical biosensors; vertically aligned carbon nanofibers; Atomic force microscopy; Carbon; Force; Substrates; Surface treatment; Acid; Atomic; Carbon; Force Microscopy; Nanofiber; Nanomaterials; etch;
Conference_Titel :
Nanotechnology Materials and Devices Conference (NMDC), 2010 IEEE
Conference_Location :
Monterey, CA
Print_ISBN :
978-1-4244-8896-4
DOI :
10.1109/NMDC.2010.5652462