DocumentCode
3350615
Title
THz emission of coherent plasmons in semiconductor superlattices
Author
Bratschitsch, R. ; Kersting, R. ; Strasser, G. ; Unterrainer, K. ; Fischler, W. ; Hopfel, R.A.
Author_Institution
Inst. for Solid State Electron., Tech. Univ. Wien, Austria
fYear
1992
fDate
23-28 May 1992
Firstpage
221
Abstract
Summary form only given. Ultrafast excitation of n-doped GaAs layers leads to THz emission from coherent plasma oscillations. The emission frequency of this THz source is given by the simple plasma frequency formula /spl omega//sub p/=(ne/sup 2//m*/spl epsiv/)/sup 1/2/ where n is the number of extrinsic electrons which are confined between the surface depletion field and the GaAs substrate. The desired frequency can be controlled by changing the number of electrons n via the doping concentration of the material. Another possibility to determine the emission frequency /spl omega//sub p/ is to change the effective mass m* of the electrons. This can be accomplished by placing the electrons in the periodic potential of a superlattice.
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; semiconductor superlattices; surface plasmons; time resolved spectra; GaAs-AlGaAs; THz emission; coherent plasma oscillations; coherent plasmons; n-doped layers; periodic potential; semiconductor superlattices; surface depletion field; ultrafast excitation; Doping; Effective mass; Electron emission; Frequency; Gallium arsenide; Plasma confinement; Plasma sources; Plasmons; Semiconductor superlattices; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics and Laser Science Conference, 1999. QELS '99. Technical Digest. Summaries of Papers Presented at the
Conference_Location
Baltimore, MD, USA
Print_ISBN
1-55752-576-X
Type
conf
DOI
10.1109/QELS.1999.807567
Filename
807567
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