DocumentCode
3351278
Title
Direct observation of phase separation in InGaN quantum wells by microphotoluminescence imaging with spatial resolution of 150 nm
Author
Someya, Takao ; Arakawa, Yasuhiko
Author_Institution
Inst. of Ind. Sci., Tokyo Univ., Japan
fYear
1992
fDate
23-28 May 1992
Firstpage
248
Lastpage
249
Abstract
Summary form only given. Optical effects of phase separation in InGaN quantum wells (QWs) such as carrier localization are still open questions although great research efforts has been made recently. To have an insight into such effects in high-quality InGaN QWs, micro-photoluminescence (/spl mu/-PL) intensity imaging technique was employed in this work. The high spatial resolution of 150 nm, which is comparable to or even smaller than that of conventional near-field scanning optical microscopy (NSOM), was achieved by an objective lens using an immersion oil. Such high resolution in optical spectroscopy enables us to spectroscopically probe into phase separation in InGaN QWs and other microscopic optical properties inherent in nitride-semiconductors.
Keywords
III-V semiconductors; gallium compounds; indium compounds; phase separation; photoluminescence; semiconductor quantum wells; 150 nm; InGaN; InGaN quantum well; carrier localization; microphotoluminescence imaging; nitride semiconductor; optical spectroscopy; phase separation; spatial resolution; Aerosols; Atom lasers; Chromium; Helium; Laser theory; Mercury (metals); Optical buffering; Optical imaging; Optical microscopy; Spectroscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics and Laser Science Conference, 1999. QELS '99. Technical Digest. Summaries of Papers Presented at the
Conference_Location
Baltimore, MD, USA
Print_ISBN
1-55752-576-X
Type
conf
DOI
10.1109/QELS.1999.807627
Filename
807627
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