DocumentCode
3351380
Title
Temperature dependence of lasing characteristics for 1.3 /spl mu/m GaAs-based quantum dot lasers
Author
Huffaker, D.L. ; Shchekin, O. ; Park, Gi-Ho ; Zou, Z.Z. ; Deppe, Dennis G.
Author_Institution
Microelectron. Res. Center, Texas Univ., Austin, TX, USA
fYear
1992
fDate
23-28 May 1992
Firstpage
253
Lastpage
254
Abstract
Summary form only given. Recently ground-state 1.3 /spl mu/m wavelength lasing has been demonstrated at room temperature from GaAs-based uncoated heterostructure lasers using an InGaAs quantum dot (QD) active region. Despite low threshold current density at 77 K, lasing at the higher temperatures shows a rapid increase in threshold occurring above 200 K. In this talk we present data characterizing the QD laser´s threshold temperature dependence, and show that it comes mainly from nonradiative recombination from the QD higher energy levels and wetting layer. The results suggest that very low threshold current density can be obtained at room temperature once nonradiative recombination is eliminated.
Keywords
III-V semiconductors; current density; gallium arsenide; nonradiative transitions; quantum well lasers; semiconductor quantum dots; 1.3 micron; GaAs; GaAs-based quantum dot lasers; InGaAs; InGaAs quantum dot active region; ground-state lasing; lasing characteristics; nonradiative recombination; room temperature; temperature dependence; uncoated heterostructure lasers; very low threshold current density; Laser theory; Lattices; Photonic band gap; Photonic crystals; Quantum dot lasers; Spontaneous emission; Surface emitting lasers; Temperature dependence; US Department of Transportation; Vertical cavity surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics and Laser Science Conference, 1999. QELS '99. Technical Digest. Summaries of Papers Presented at the
Conference_Location
Baltimore, MD, USA
Print_ISBN
1-55752-576-X
Type
conf
DOI
10.1109/QELS.1999.807634
Filename
807634
Link To Document