• DocumentCode
    3352021
  • Title

    Effect of carbon on the valence band offset of Si/sub 1-x-y/Ge/sub x/C/sub y//Si heterojunctions

  • Author

    Chang, C.L. ; St.Amour, A. ; Sturm, J.C.

  • Author_Institution
    Dept. of Electr. Eng., Princeton Univ., NJ, USA
  • fYear
    1996
  • fDate
    8-11 Dec. 1996
  • Firstpage
    257
  • Lastpage
    260
  • Abstract
    We have grown pseudomorphic single crystal Si/sub 1-x-y/Ge/sub x/C/sub y/ layers on Si (100) substrates by Rapid Thermal Chemical Vapor Deposition with up to 2.5% substitutional carbon. Capacitance-voltage as well as admittance spectroscopy measurements have been used to study the effect of carbon on the valence band offset of compressively strained Si/sub 1-x-y/Ge/sub x/C/sub y//(100) Si heterojunctions. The valence band offset of Si/sub 1-x-y/Ge/sub x/C/sub y//Si decreased by 25-30 meV as 1% carbon was added. Previous studies showed that 1% carbon increased the bandgap of strained Si/sub 1-x/Ge/sub x/ alloys by 21-26 meV, indicating that all the change in bandgap of Si/sub 1-x/Ge/sub x/ as carbon was added is accommodated in the valence band.
  • Keywords
    Ge-Si alloys; capacitance; carbon; chemical vapour deposition; electric admittance; energy gap; interface states; rapid thermal processing; semiconductor heterojunctions; semiconductor materials; silicon; valence bands; C effect; Si; Si (100) substrates; Si/sub 1-x-y/Ge/sub x/C/sub y//Si heterojunctions; SiGeC-Si; admittance spectroscopy; bandgap; capacitance-voltage characteristics; compressively strained heterojunctions; pseudomorphic single crystal; rapid thermal chemical vapor deposition; valence band offset; Capacitance measurement; Capacitance-voltage characteristics; Current measurement; Doping; Frequency; Heterojunctions; Leakage current; Photonic band gap; Temperature; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1996. IEDM '96., International
  • Conference_Location
    San Francisco, CA, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-3393-4
  • Type

    conf

  • DOI
    10.1109/IEDM.1996.553579
  • Filename
    553579