DocumentCode
3352900
Title
Ultra-pure and environmentally friendly wet chemistry made possible through on-site recycling and reprocessing
Author
Adams, John A. ; Ersichini, David W P
Author_Institution
IPEC/Athens Corp., Oceanside, CA, USA
fYear
1995
fDate
17-19 Sep 1995
Firstpage
187
Lastpage
190
Abstract
Corporations are facing the ever increasing demands to reduce the environmental impact from Semiconductor manufacturing. At the same time, the latest wafer designs require ever increasing purity of chemicals and processes. Many times these two requirements are contradictory, however, in the area of wet chemistry, both the reduction of environmental wastes and the improvement of chemical purity can be readily and cost effectively achieved through the use of on-site reclaim and reprocessing. Sulfuric acid, Hydrofluoric acid, and Isopropyl alcohol are leading chemicals for recycling due to their ultra-high purity requirements, large consumption volumes, high cost, waste created, and their disposal challenge. This paper is an overview of the technologies employed to enable reprocessing and includes several case studies to demonstrate the economic and environmental benefits of reprocessing
Keywords
chemistry; environmental factors; recycling; semiconductor device manufacture; H2SO4; HF; economics; environmental waste disposal; hydrofluoric acid; isopropyl alcohol; on-site recycling; reprocessing; semiconductor manufacturing; sulfuric acid; ultra-pure chemicals; wet chemistry; Chemical hazards; Chemical processes; Chemical technology; Chemistry; Costs; Environmental economics; Hafnium; Manufacturing processes; Recycling; Semiconductor device manufacture;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 1995., IEEE/UCS/SEMI International Symposium on
Conference_Location
Austin, TX
Print_ISBN
0-7803-2928-7
Type
conf
DOI
10.1109/ISSM.1995.524387
Filename
524387
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